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The 248 nm photochemistry of methyl iodide thin films was studied using reflection absorption infrared spectroscopy (RAIRS), temperature programmed desorption (TPD) and time-of-flight quadrupole mass spectrometry (TOF-QMS). The formation of two major photoproducts, CH2I2 and CH4, in the film was characterized by RAIRS and TPD. At all laser energies used in this study, CH3, I, and CH3I were ejected into the gas phase. The CH3 TOF distribution showed the signature of gas phase CH3I photodissociation dynamics--two sharp peaks corresponding to production of iodine atoms in the I (2P3/2) and I* (2P1/2) states. The TOF distributions of I and CH3I were fit to Maxwell-Boltzmann distributions corresponding to temperatures of 1400 K and 1170 K, respectively. The photochemistry of methyl iodide thin films can be understood in terms of photoprocess occurring in the film and at the film surface.© (1995) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only. |
