Fabrication of Thin Film Resistors and Resistor Networks by a Selective Etching Process
| Autor: | D. P. Runthala, B. R. Marathe, S. C. Bawa |
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| Rok vydání: | 1974 |
| Předmět: |
Resistive touchscreen
Fabrication Materials science Yield (engineering) business.industry Electrical engineering Computer Science::Other Computer Science Applications Theoretical Computer Science law.invention Etching (microfabrication) law Optoelectronics Electrical and Electronic Engineering Thin film Resistor business Layer (electronics) Electrical conductor |
| Zdroj: | IETE Journal of Research. 20:602-606 |
| ISSN: | 0974-780X 0377-2063 |
| DOI: | 10.1080/03772063.1974.11487489 |
| Popis: | Results on the selective etching of a two layer system (resistive layer and conductive layer) on glass substrates to achieve resistors/resistor-networks have been described. This method is compared with the earlier used methods. The method reported in the paper results in good resolution of thin film patterns, smaller area flexibility, higher yield and lower cost. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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