Direct Observation of Platinum Etching during the Fluorination of a Pt/LaF3/Si Structure

Autor: A. A. Nefedov, S. S. Fanchenko, U. Roth, L. Bartholomäus, Markus Heyde, Werner Moritz, S. E. Sbitnev, Klaus Rademann
Rok vydání: 1999
Předmět:
Zdroj: physica status solidi (a). 176:943-952
ISSN: 1521-396X
0031-8965
DOI: 10.1002/(sici)1521-396x(199912)176:2<943::aid-pssa943>3.0.co;2-4
Popis: The platinum etching during fluorination of the Pt surface of a Pt/LaF 3 /Si(111) sandwich structure is investigated by means of X-ray methods, atomic force microscopy (AFM), and quartz crystal microbalance (QCM). XeF 2 and F 2 have been used as sources of fluorine atoms. The X-ray triple-crystal rocking curve measurements show a smoothing of the rough Pt surface due to the interaction with fluorine. AFM observations confirm this change in surface roughness. For verification of these data, X-ray θ-2θ scans have been performed for several samples using a Seeman-Bohlin X-ray diffractometer. The decrease of the integrated Pt peak intensity for a sample that had been fluorinated for about 30 h in XeF 2 shows a decrease of the film thickness from initially 40 nm by 25 ± 5%. QCM measurements showed an initial increase of the total mass followed by a decrease after 80 min. We conclude that the surface smoothing can be explained by the etching of platinum with the formation of a platinum fluoride layer during the first stage of this process followed by decomposition and desorption of this PtF x layer.
Databáze: OpenAIRE
Externí odkaz: