Calculation of the distribution of film thickness on a rotating disk substrate in a sputtering system with long plate targets

Autor:	O. D. Volpian, A I Kuzmichev, I M Drozd, Yu. A. Obod
Rok vydání:	2017
Předmět:	Condensed Matter::Materials Science History Optics Materials science Distribution (number theory) Physics::Instrumentation and Detectors business.industry Sputtering Optical engineering Substrate (electronics) business Computer Science Applications Education
Zdroj:	Journal of Physics: Conference Series. 872:012028
ISSN:	1742-6596 1742-6588
DOI:	10.1088/1742-6596/872/1/012028
Popis:	The results of calculation of the film thickness distribution of sputtered material deposited on a horizontal rotating disk substrate in a multi-cathode sputtering system with horizontal and inclined long plate targets are presented. The possibility of obtaining the high uniformity in the thickness distribution is shown, which makes it possible to recommend the similar system for use in precision optical technology.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5e54f98c818d12cd55bda87464aae7fe https://doi.org/10.1088/1742-6596/872/1/012028 Zobrazit plný text záznamu