High-power UV laser machining of silicon wafers

Autor: Corey Dunsky, Edward C. Rea, Tom M. Corboline
Rok vydání: 2003
Předmět:
Zdroj: Fourth International Symposium on Laser Precision Microfabrication.
ISSN: 0277-786X
DOI: 10.1117/12.540931
Popis: As the demand for semiconductor devices based upon ever-thinner silicon substrates continues to increase, mechanical techniques suitable for dicing wafers appear to be approaching their practical limits. Recent advances in power scaling have now enabled reliable ultraviolet-wavelength lasers to be considered to offer a flexible solution to this dilemma. This paper presents new data on the machining of thin silicon wavers using a high average power 355-nm wavelength pulsed laser. In particular, the concept of pulse repetition-rate scaling of the effective cutting speeds was investigated to determine the preferred direction for further laser development efforts.
Databáze: OpenAIRE