Structural, magnetic and transport properties of ion beam deposited Co thin films

Autor:	J. M. Teixeira, Alberto M. Pereira, F. Carpinteiro, R. Fermento, João Bessa Sousa, João P. Araújo, Diana C. Leitao, João Ventura
Rok vydání:	2008
Předmět:	Materials science Ion beam Magnetoresistance Analytical chemistry Crystal growth Condensed Matter Physics Electronic Optical and Magnetic Materials Amorphous solid Sputtering Electrical resistivity and conductivity Materials Chemistry Ceramics and Composites Texture (crystalline) Thin film
Zdroj:	Journal of Non-Crystalline Solids. 354:5279-5281
ISSN:	0022-3093
DOI:	10.1016/j.jnoncrysol.2008.05.077
Popis:	Magnetic nanostructures display new and interesting physical phenomena and are currently used in a large variety of applications. We studied the structural, magnetic and transport properties of Co thin films deposited by ion beam sputtering. We probed the influence of the buffer layer material (Al, Cu, Ru or Ta) and thickness (10–100 A) on the structural properties of Co thin films. Using X-ray diffraction we observed that textured fcc Co films can be grown on amorphous Ta as thin as 20 A but for the other buffer layers no texture is observed. We also studied by magneto-optical Kerr effect (MOKE) the magnetic properties of the Co thin films as a function of Co thickness (100–1000 A). Finally, the electrical resistivity and anisotropic magnetoresistance (AMR) of our Co thin films (on a Ta buffer) was obtained as a function of Co thickness.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5dd9a67f9d3a9ac0dac0e2210883eb10 https://doi.org/10.1016/j.jnoncrysol.2008.05.077 Zobrazit plný text záznamu Full Text from ScienceDirect