Corrosion resistance properties and preparation of α-C3N4 thin films

Autor:	Fan Xiangjun, Zhang Wei, Guo Huaixi, Zhang Zhihong, Xu Yi
Rok vydání:	1999
Předmět:	Multidisciplinary Materials science Carbon film Coating Chemical engineering Plasma-enhanced chemical vapor deposition engineering Thin film engineering.material Combustion chemical vapor deposition Ternary operation Layer (electronics) Corrosion
Zdroj:	Wuhan University Journal of Natural Sciences. 4:171-174
ISSN:	1993-4998 1007-1202
Popis:	Well adhered C3N4 films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) on industrial pure iron substrates using ternary Si−N−C films as buffer layer. XRD measurement showed that the C3N4 films belong to the α-C3N4 phase. Electrochemical experiments showed that the corrosive resistance of the pure iron raised by two orders of magnitude after being covered with the α-C3N4 coating.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5d6dd1da1bb6652f1a7cd4ddbf712243 https://doi.org/10.1007/bf02841492 Zobrazit plný text záznamu Full text from SpringerLink