Self-focussing of a laser beam in a multiply ionized, absorbing plasma

Autor:	V. Del Pizzo, M. R. Siegrist, Barry Luther-Davies
Rok vydání:	1979
Předmět:	Materials science business.industry Plasma parameters General Engineering Bremsstrahlung Pulse duration Self-focusing General Chemistry Plasma Molar absorptivity Pulse (physics) Optics Physics::Plasma Physics Ionization General Materials Science Atomic physics business
Zdroj:	Applied physics. 18:199-204
ISSN:	1432-0630 0340-3793
DOI:	10.1007/bf00934416
Popis:	Using a numerical code we have studied self-focussing of an intense laser beam which is propagating through a multiply-ionized absorbing plasma. The effecient self-focussing threshold has been calculated as a function of various pulse and plasma parameters.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5d1ea3a8eb78f2f342cafead07cb02b4 https://doi.org/10.1007/bf00934416 Zobrazit plný text záznamu Full text from SpringerLink