| Autor: |
Sergiy Al. Kostyukevych, Viacheslav V. Petrov, Ekaterina V. Kostyukevich, Anna N. Morozovska, Igor V. Tverdokhleb, Petr E. Shepeliavyi, Andrey A. Kryuchin |
| Rok vydání: |
2005 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
The results of experimental and theoretical investigations aimed at applying non-organic photoresists for mastering optoelectronic devices are represented. Samples for investigations were prepared using thermal evaporation of the glass with different As-S-Se compositions in vacuum onto a glass substrate. When exposing photoresist to obtain interference 2D/3D patterns, we used He-Cd laser irradiation with the wavelength 440 nm. The exposure was chosen from 20 to 150 mJ/cm 2 , and spatial frequencies of obtained gratings were from 600 to 3600 mm -1 . The resist samples were processed using a waterless organic selective etchant based on amines. Results of investigations showed that As 40 S 60-x Se x (x=0-20) photoresist is characterized by higher holographic sensitivity (i.e. energetic expose necessary for providing given value of the diffraction efficiency). This enables us to create various combined optical-digital protective elements and master-copies for all types of optical disks (CD, DVD). |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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