Plasma and particle flux characterization of the a-C:H deposition process by ion-assisted methods
| Autor: | R. Kleber, H. Ehrhardt, K. Jung, A. Krüger, Till Dipl.-Phys. Wallendorf, F. Wolf, G. Schaarschmidt, S. Porsch, W. Scharff, W. Dworschak, F. Scholze, J. Gerber |
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| Rok vydání: | 1991 |
| Předmět: |
Glow discharge
Materials science Mechanical Engineering Ion plating Analytical chemistry Plasma Condensed Matter Physics Ion symbols.namesake Ion beam deposition Physics::Plasma Physics Mechanics of Materials symbols Langmuir probe General Materials Science Quadrupole mass analyzer Electron ionization |
| Zdroj: | Materials Science and Engineering: A. 140:788-794 |
| ISSN: | 0921-5093 |
| DOI: | 10.1016/0921-5093(91)90515-o |
| Popis: | In the present study mass spectrometric measurements were carried out on the ion flux to the substrate during the a-C:H deposition process by ion plating and r.f. glow discharge. For this purpose a portion of ion flux striking the substrate was passed through an aperture into a differentially pumped chamber, in which the energy distribution of the ions is measured by an electrostatic analyser and the e/m value by a quadrupole mass spectrometer. The discharge conditions were measured with a Langmuir probe. Depending on the discharge conditions and the hydrocarbon gas used, typical ion groups are observed. These ion groups are generated by electron impact or ion-molecule reactions. |
| Databáze: | OpenAIRE |
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