Spatially resolved X-ray diffraction as a tool for strain analysis in laterally modulated epitaxial structures

Autor: M. Sarzynski, Jaroslaw Z. Domagala, Zbigniew R. Zytkiewicz, A. Wierzbicka
Rok vydání: 2009
Předmět:
Zdroj: Crystal Research and Technology. 44:1089-1094
ISSN: 1521-4079
0232-1300
DOI: 10.1002/crat.200900473
Popis: Spatially resolved X-ray diffraction (SRXRD) is applied for micro-imaging of strain in laterally modulated epitaxial structures. In GaAs layers grown by liquid phase epitaxial lateral overgrowth (ELO) on SiO2-masked GaAs substrates a downward tilt of ELO wings caused by their interaction with the mask is observed. The distribution of the tilt magnitude across the wings width is determined with μm-scale spatial resolution. This allows measuring of the shape of the lattice planes in individual ELO stripes. If a large area of the sample is studied the X-ray imaging provides precise information on the tilt of an individual wing and its distribution. In heteroepitaxial GaSb/GaAs ELO layers local mosaicity in the wing area is found. By the SRXRD the size of microblocks and their relative misorientation were analyzed. Finally, the SRXRD technique was applied to study distribution of localized strain in AlGaN epilayers grown by MOVPE on bulk GaN substrates with AlN mask. X-ray mapping proves that by mask patterning strain in AlGaN layer can be easily engineered, which opens a way to produce thicker, crack-free AlGaN layers with a higher Al content needed in GaN-based laser diodes. All these examples show that high spatial and angular resolutions offered by SRXRD makes the technique a powerful tool to study local lattice distortions in semiconductor microstructures. (© 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
Databáze: OpenAIRE
Externí odkaz: