Mid-low energy implantation tilt angle monitoring with photomodulated reflectance measurement
| Autor: | Janos Szivos, a. Kun, Leonard M. Rubin, B. Bartal, A. Bolcskei-Molnar, Anita Pongracz, Bálint Fodor, J. Byrnes, Gy. Nadudvari, F. Ujhelyi |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Range (particle radiation)
Materials science business.industry Resolution (electron density) 0211 other engineering and technologies 020101 civil engineering 02 engineering and technology Reflectivity 0201 civil engineering Optics Tilt (optics) Ion implantation 021105 building & construction Process control Wafer Sensitivity (control systems) business |
| Zdroj: | 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC). |
| DOI: | 10.1109/asmc.2019.8791776 |
| Popis: | Photo-modulated Reflectivity Measurement (PMR) is an excellent technology for ion implantation dose and tilt angle monitoring of as-implanted pre-annealed production wafers. The SEMILAB PMR-3000 is a unit for in-line monitoring of ion implantation prior to the thermal annealing process step. The enhanced optical system ensures accurate measurement over the whole dose range without insensitive regions in the mid-dose range. Typical dose detectability is |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|