A power supply for magnetron sputtering systems

Autor:	N. S. Sochugov, V. O. Oskirko, R. E. Spirin
Rok vydání:	2013
Předmět:	Electric arc Materials science Duty cycle business.industry Optoelectronics Thin film Sputter deposition business Instrumentation Arc suppression Power (physics) Pulse (physics) Electronic circuit
Zdroj:	Instruments and Experimental Techniques. 56:178-184
ISSN:	1608-3180 0020-4412
DOI:	10.1134/s0020441213010302
Popis:	A design and electric circuits of the power supply for magnetron sputtering systems with a power of up to 5 kW are described. The power supply is intended for operation in direct-current (DC) or pulse modes with a pulse repetition rate of up to 100 kHz. The arc suppression system limits the energy delivered to the arc discharge at about 110 mJ in the DC mode and 9 mJ in the pulse mode, respectively. The possibilities of optimizing coatings by selecting working parameters of the power supply were demonstrated by the example of thin-film coatings of two types (Ag and Ga-doped ZnO thin films).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5c5935e3903d384945de07158775b0f7 https://doi.org/10.1134/s0020441213010302 Zobrazit plný text záznamu Plný text ve formátu PDF