| Autor: |
Khaled Hasnat, W.-K. Shih, S.A. Hareland, Al F. Tasch, V.M. Agostinelli, S. Jallepalli, Choh-Fei Yeap, Christine M. Maziar |
| Rok vydání: |
1997 |
| Předmět: |
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| Zdroj: |
IEEE Transactions on Electron Devices. 44:129-138 |
| ISSN: |
0018-9383 |
| DOI: |
10.1109/16.554802 |
| Popis: |
A thermionic emission model based on a non-Maxwellian electron energy distribution function for the electron gate current in NMOSFET's is described. The model uses hydrodynamic equations to describe more correctly the electron transport and gate injection phenomena in submicron devices. A generalized analytical function is used to describe the high-energy tail of the electron energy distribution function. Coefficients of this generalized function are determined by comparing simulated gate currents with the experimental data. This model also includes the self-consistent calculation of the tunneling component of the gate current by using the WKB approximation, and by using a more accurate representation of the oxide barrier by including the image potential. Good agreement with gate currents over a wide range of bias conditions for three different technological sets of devices are demonstrated by using a single set of coefficients. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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