Diffusion of oxygen molecules in fluorine-doped amorphous SiO2

Autor:	Koichi Kajihara, Hayato Kamioka, Linards Skuja, Taisuke Miura, Hideo Hosono, Masahiro Hirano
Rok vydání:	2010
Předmět:	Materials science Mechanical Engineering Doping Analytical chemistry chemistry.chemical_element Activation energy Condensed Matter Physics Oxygen Dissociation (chemistry) Amorphous solid chemistry Mechanics of Materials Fluorine General Materials Science Solubility Glass transition
Zdroj:	Materials Science and Engineering: B. 173:158-161
ISSN:	0921-5107
DOI:	10.1016/j.mseb.2010.01.002
Popis:	Effects of fluorine doping on the diffusion of interstitial oxygen molecules (O2) in amorphous SiO2 (a-SiO2) were compared to those obtained from a-SiO2 containing SiOH groups. Incorporation of moderate concentration ( ∼ 1 0 19 cm−3) of SiF groups gives rise to minor changes in diffusion parameters between 800 and 1100 ° C: only a slight decrease in solubility and an increase in the activation energy for diffusion can be detected. Incorporation of SiOH groups has similar weak effects on the solubility and activation energy for diffusion. These minor changes are most likely due to the enhancement of the flexibility of local Si–O network as a result of the dissociation of the network by SiOH and SiF groups. However, in contrast to the SiF doping, SiOH doping leads to a notable decrease in the diffusion coefficient. The heat of solution changes by ∼ 0.1 –0.2 eV at ∼ 1000 ° C and it is attributed to the glass transition of a-SiO2.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5c261beea72fe8a609e738ccbad78333 https://doi.org/10.1016/j.mseb.2010.01.002 Zobrazit plný text záznamu Full Text from ScienceDirect