Development of ultra-short pulse VUV laser system for nanoscale processing

Autor:	A. Yokotani, Shoichi Kubodera, Hironari Zushi, Masanori Kaku, Ryota Matsumoto, Shinya Harano, Masahito Katto, Noriaki Miyanaga, Wataru Nagaya
Rok vydání:	2010
Předmět:	Materials science business.industry General Chemistry Plasma Radiation Laser law.invention Wavelength Optics law Torr Field desorption Ionization Sapphire Optoelectronics General Materials Science business
Zdroj:	Applied Physics A. 101:297-301
ISSN:	1432-0630 0947-8396
Popis:	We have developed intense vacuum ultraviolet (VUV) radiation sources for advanced material processing, such as photochemical surface reactions and precise processing on a nanometer scale. We have constructed a new VUV laser system to generate sub-picosecond pulses at the wavelength of 126 nm. A seed VUV pulse was generated in Xe as the 7th harmonic of a 882-nm Ti:sapphire laser. The optimum conversion was achieved at the pressure of 1.2 Torr. The seed pulse will be amplified by the $\mathrm{Ar}_{2}^{*}$ media generated by an optical-field-induced ionization Ar plasma produced by the Ti:sapphire laser. We have obtained a gain coefficient of g=0.16 cm−1. Our developing system will provide VUV ultra-short pulses with sub-μJ energy at a repetition rate of 1 kHz.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5c09dcbbca06829b4237214ffa427045 https://doi.org/10.1007/s00339-010-5820-z Zobrazit plný text záznamu Plný text ve formátu PDF