Improvement of Electrical Performances of Tungsten Dual-Work Function Gate Electrode Using WSiN/WN/Ti Stacks as a Diffusion Barrier Metal

Autor:	Hyun-Phill Kim, Il-Cheol Rho, Choon-Hwan Kim, Myung-Goon Gil, Hyo-Sang Kang
Rok vydání:	2010
Zdroj:	ECS Meeting Abstracts. :952-952
ISSN:	2151-2043
DOI:	10.1149/ma2010-01/17/952
Popis:	not Available.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5bfd5793e9f66245b372f99e24207443 https://doi.org/10.1149/ma2010-01/17/952 Zobrazit plný text záznamu