Surface Microroughness of Silicon in Wet Process and its Minimization

Autor:	Kenji Shimaoka, Tadahiro Ohmi, Hitoshi Morinaga
Rok vydání:	2007
Předmět:	Surface (mathematics) Materials science Silicon chemistry Scientific method chemistry.chemical_element General Materials Science Minification Condensed Matter Physics Engineering physics Atomic and Molecular Physics and Optics
Zdroj:	Solid State Phenomena. 134:45-48
ISSN:	1662-9779
DOI:	10.4028/www.scientific.net/ssp.134.45
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5bf6906b49b3e11f114365a744dac1a2 https://doi.org/10.4028/www.scientific.net/ssp.134.45 Zobrazit plný text záznamu