Flatness maintenance and roughness reduction of silicon mirror in chemical mechanical polishing process
| Autor: | Xinchun Lu, HuiJia Zhao, Bocheng Jiang, Bingquan Wang, Yuhong Liu, Dewen Zhao |
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| Rok vydání: | 2019 |
| Předmět: |
Materials science
Silicon Flatness (systems theory) General Engineering chemistry.chemical_element Polishing Mechanical engineering 02 engineering and technology Surface finish 010402 general chemistry 021001 nanoscience & nanotechnology Laser 01 natural sciences 0104 chemical sciences Optical reflection law.invention chemistry law Chemical-mechanical planarization Surface roughness General Materials Science 0210 nano-technology |
| Zdroj: | Science China Technological Sciences. 63:166-172 |
| ISSN: | 1869-1900 1674-7321 |
| DOI: | 10.1007/s11431-018-9414-6 |
| Popis: | As an important optical component in laser system, silicon mirror surface is required to have micron-level flatness and subnanometer-level roughness. The research concentrates on how to improve roughness as far as possible while maintaining flatness of silicon mirror surface during chemical mechanical polishing (CMP) process. A polishing edge effect model is established to explain the reason of flatness deterioration, and a roughness theoretical model is set up to get the limit of perfect surface roughness. Based on the models above, a polishing device is designed to maintain the surface flatness, and the optimized polishing process parameters are obtained by orthogonal tests to get a near-perfect surface roughness. Finally the maintenance of flatness and the improvement of roughness can be achieved at the same time in one step of CMP process. This work can be a guide for silicon mirror manufacture to improve optical reflection performance significantly. |
| Databáze: | OpenAIRE |
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