Investigation into the optoelectrical properties of TiO2thin films, deposited by RF magnetron sputtering using powder target
Autor: | M. Abaab, I. Ben Jemaa, F. Chaabouni |
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Rok vydání: | 2017 |
Předmět: |
010302 applied physics
Argon Materials science Band gap Analytical chemistry chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces Sputter deposition 021001 nanoscience & nanotechnology Condensed Matter Physics Thermal conduction 01 natural sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Dielectric spectroscopy Condensed Matter::Materials Science chemistry Electrical resistivity and conductivity Phase (matter) 0103 physical sciences Materials Chemistry Electrical and Electronic Engineering Thin film 0210 nano-technology |
Zdroj: | physica status solidi (a). 214:1600426 |
ISSN: | 1862-6300 |
DOI: | 10.1002/pssa.201600426 |
Popis: | TiO2 thin films were deposited at different deposition times and argon flows, onto glass substrates by radio-frequency (RF) magnetron sputtering technique, using a powder target. The X-ray diffraction analysis shows that the increase in the deposition time introduces an improvement in crystallinity of the deposited films with the formation of a rutile phase. This rutile phase is maintained for the samples elaborated at different argon flows. The optical transmittance for all the samples is found to be higher than 75% in the visible region. A slight decrease of the band gap values is observed for all the studied films. The electrical conductivity and conduction mechanism are also studied by means of the impedance spectroscopy technique. The activation energy values calculated from angular frequency and DC conductivity are in good agreement, indicating that the conduction mechanism is thermally activated by hopping between localized states. Additionally, the investigation of the frequency and temperature dependence of AC conductivity agrees with the correlated barrier hopping model. |
Databáze: | OpenAIRE |
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