Etching mechanism of LiTaO3 crystals in CHF3/Ar plasma

Autor:	Shaohong Wang, L. P. Dai, W. B. Luo, Zhong Zhiqin, M. R. Li, M. C. Cao
Rok vydání:	2021
Předmět:	Crystal Plasma etching Materials science X-ray photoelectron spectroscopy Etching (microfabrication) Analytical chemistry Plasma Condensed Matter Physics Electronic Optical and Magnetic Materials
Zdroj:	Ferroelectrics. 582:28-35
ISSN:	1563-5112 0015-0193
DOI:	10.1080/00150193.2021.1951032
Popis:	CHF3/Ar plasma was used to etch LiTaO3 crystal by inductively coupled plasmas technique. X-ray photoelectron spectroscopy was performed to investigate the etching mechanism. It was found that chemi...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5b3e227569b8e7831abbc2945351da44 https://doi.org/10.1080/00150193.2021.1951032 Zobrazit plný text záznamu