The influence of oxygen ratio on the plasma parameters of argon RF inductively coupled discharge
| Autor: | Yan Wang, Wenwen Xiong, Junfang Chen, Yong Wang |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Electron density Langmuir Argon Materials science Plasma parameters Analytical chemistry chemistry.chemical_element 02 engineering and technology Plasma 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Oxygen Surfaces Coatings and Films chemistry Physics::Plasma Physics 0103 physical sciences Electron temperature Emission spectrum 0210 nano-technology Instrumentation |
| Zdroj: | Vacuum. 149:291-296 |
| ISSN: | 0042-207X |
| DOI: | 10.1016/j.vacuum.2018.01.008 |
| Popis: | In this paper, the RF-coupled plasma characteristics of argon and oxygen mixed gases were analyzed by emission spectra and Langmuir single probes. The experimental pressure was kept at 0.63 Pa, and the electron temperature and electron density were measured by Boltzmann curve method and Langmuir single probe respectively under different oxygen ratio. The results demonstrate that increasing the oxygen content reduces the plasma electron density, and the plasma will change from E mode to H mode when the discharge power increase from 350 W to 400 W if the discharge gas is pure argon or oxygen ratio is low, but the plasma is in a single E-mode at relatively high oxygen ratios. When the power reaches 450 W, the plasma becomes unstable and the state of plasma will change no matter what mode it is (H mode or E mode). In addition, as the oxygen ratio increases, there is a good agreement between the plasma electron density and the argon 738.74 nm line intensity. However, the electron temperature will decrease in H mode. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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