Evaluation of the accuracy of stopping and range of ions in matter simulations through secondary ion mass spectrometry and Rutherford backscattering spectrometry for low energy heavy ion implantation
| Autor: | Michael Titze, Daniel Perry, Todd A. Byers, Jose Pacheco, Stuart B. Van Deusen, Edward S. Bielejec, Duncan L. Weathers |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Range (particle radiation)
Materials science Ion beam Physics::Instrumentation and Detectors Surfaces and Interfaces Condensed Matter Physics Rutherford backscattering spectrometry Surfaces Coatings and Films Ion Secondary ion mass spectrometry Low energy Ion implantation Physics::Plasma Physics Heavy ion Atomic physics |
| Zdroj: | Journal of Vacuum Science & Technology A. 39:063222 |
| ISSN: | 1520-8559 0734-2101 |
| Popis: | The freely available “Stopping and Range of Ions in Matter” (SRIM) code is used for evaluating ion beam ranges and depth profiles. We present secondary ion mass spectrometry and Rutherford backscattering experimental results of Si samples implanted with low energy Sb ions to evaluate the accuracy of SRIM simulations. We show that the SRIM simulation systematically overestimates the range by 2–6 nm and this overestimation increases for larger ion implantation energy. For the lowest energy implantation investigated, here we find up to a 25% error between the SRIM simulation and the measured range. The ion straggle shows excellent agreement between simulation and experimental results. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|