Polish Scratch Simulation vs. Polish Tool Type
Autor: | Kevin Moeggenborg, Meong Keun Ju |
---|---|
Rok vydání: | 2022 |
Předmět: | |
Zdroj: | Materials Science Forum. 1062:175-179 |
ISSN: | 1662-9752 |
DOI: | 10.4028/p-wkn17q |
Popis: | Wafer scratching from handling and processing can impact the performance of devices grown on a substrate. Knowledge of process conditions and modeling of scratches on wafers can be used to elucidate the root cause of scratches so that they can be eliminated. |
Databáze: | OpenAIRE |
Externí odkaz: |