Polish Scratch Simulation vs. Polish Tool Type

Autor: Kevin Moeggenborg, Meong Keun Ju
Rok vydání: 2022
Předmět:
Zdroj: Materials Science Forum. 1062:175-179
ISSN: 1662-9752
DOI: 10.4028/p-wkn17q
Popis: Wafer scratching from handling and processing can impact the performance of devices grown on a substrate. Knowledge of process conditions and modeling of scratches on wafers can be used to elucidate the root cause of scratches so that they can be eliminated.
Databáze: OpenAIRE