Effect of material of upper electrode on electric strength of MIS system

Autor:	V. V. Motoshkin
Rok vydání:	1979
Předmět:	Materials science Anodizing General Physics and Astronomy chemistry.chemical_element Substrate (electronics) Electrolyte Dielectric law.invention Capacitor chemistry.chemical_compound chemistry law Aluminium Tantalum pentoxide Electrode Composite material
Zdroj:	Soviet Physics Journal. 22:906-907
ISSN:	1573-9228 0038-5697
Popis:	It is well known [i] that the electric strength Est r of thin-film MIS capacitors is affected to a considerable degree by the material of the electrodes. The present paper studies the characteristics of thin-film capacitors (TFC) based on tantalum pentoxide with electrodes of aluminum, copper, gold, and silver. A Ta205 film was obtained in a low-voltage Penning discharge [2]. Once the dielectric film was obtained an operation of healing its defects by means of electrolytic anodizing [3] was conducted. An aluminum film deposited by thermal evaporation served as the bottom electrode. The thickness of the Ta20s in all experiments was 2000Awhereasthe thickness of the upper electrode was 1500-2000 ~. In order to eliminate the influence of the scatter of Est r from substrate to substrate because of fluctuations in the quality of the dielectric and substrate, the same quantity of(TFC) with an upper electrode of A1 and one of the metals studied (e.g., A1 and Au, A1 and Cu, etc.) was deposited on each substrate.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5a79269689f3564819d5993b34fc3c2a https://doi.org/10.1007/bf00889685 Zobrazit plný text záznamu Full text from SpringerLink