Ultralow-Resistivity Molybdenum-Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-Based Precursor
| Autor: | Min-Ji Ha, Hyunchang Kim, Jeong-Hun Choi, Miso Kim, Woo-Hee Kim, Tae Joo Park, Bonggeun Shong, Ji-Hoon Ahn |
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| Rok vydání: | 2022 |
| Předmět: | |
| Zdroj: | Chemistry of Materials. 34:2576-2584 |
| ISSN: | 1520-5002 0897-4756 |
| Databáze: | OpenAIRE |
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