Block Copolymer Nanostructured Thin Films for Advanced Patterning

Autor:	Evan L. Schwartz, Michelle A. Chavis, Christopher K. Ober
Rok vydání:	2011
Předmět:	Nanostructure Materials science law Polymer chemistry Copolymer Nanotechnology Thin film Photolithography law.invention
Zdroj:	Complex Macromolecular Architectures: Synthesis, Characterization, and Self-Assembly
DOI:	10.1002/9780470825150.ch25
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5a1e05a79d18af852548c9999356ce6b https://doi.org/10.1002/9780470825150.ch25 Zobrazit plný text záznamu