Anisotropic etching for optical gratings
| Autor: | A. Klumpp, Walter Lang, K. Kühl, U. Schaber, H.U. Käufl |
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| Rok vydání: | 1996 |
| Předmět: |
Anisotropic etching
Materials science Silicon Spectrometer Physics::Instrumentation and Detectors business.industry Orientation (computer vision) Physics::Optics chemistry.chemical_element Computer Science::Other Crystal Quality (physics) chemistry Etching (microfabrication) Optoelectronics business |
| DOI: | 10.1016/b978-0-444-82312-0.50025-6 |
| Popis: | Silicon gratings can be used for IR-optical spectrometers. The gratings are realized by anisotropic etching of silicon. To obtain an optimum surface quality of the etched planes, the orientation of the mask versus the crystal must be very exact. This can be realized using a two-step etching process. The technology of the gratings and the optical characterisation are presented together with examples for astronomical application. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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