Structural and optical properties of ZrO 2 and Al 2 O 3 thin films and Bragg reflectors grown by pulsed laser deposition

Autor:	Marius Grundmann, Bernd Rheinländer, Holger Hochmuth, J. Sellmann, Ch. Sturm, Ch. Czekalla, Michael Lorenz, R. Schmidt-Grund, Jörg Lenzner
Rok vydání:	2008
Předmět:	Photoluminescence Materials science Silicon Scanning electron microscope business.industry chemistry.chemical_element Condensed Matter Physics Pulsed laser deposition Optics chemistry Ellipsometry Sapphire Thin film business Layer (electronics)
Zdroj:	physica status solidi c. 5:1240-1243
ISSN:	1610-1642 1862-6351
Popis:	ZrO2-Al2O3 Bragg reflectors for future application in ZnO based resonators grown by pulsed laser deposition on c-plane sapphire and silicon substrates show a reflectivity up to 99.8% with a layer pair number of 12.5. Layer thicknesses obtained from standard ellipsometry agree very well with thicknesses observed by transmission scanning electron microscopy. A very smooth surface roughness of Ra = 0.5 nm was observed for these Bragg reflectors. ZnO thin films grown on bulk c-plane sapphire and on Bragg reflectors revealed comparable high photoluminescence intensity. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
Databáze:	OpenAIRE
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