Electroreflectance of InN Semimetallic Thin Films

Autor:	O. V. Snitko, A. N. Krasiko, V. A. Tyagai, A. M. Evstigneev
Rok vydání:	1981
Předmět:	Friedel oscillations Interference (communication) Condensed matter physics Chemistry Fermi energy Plasma Thin film Condensed Matter Physics Capacitance Spectral line Electronic Optical and Magnetic Materials
Zdroj:	physica status solidi (b). 103:589-594
ISSN:	1521-3951 0370-1972
DOI:	10.1002/pssb.2221030216
Popis:	Plasma electroreflectance spectra (1.2 to 2.2 eV) and the bias dependence of capacitance are presented for InN semimetallic (N ≈ 3 × 1020 cm−3) thin films. The interference patterns in the electroreflectance spectra are analysed and grouped into two types according to the form of the electroreflectance undulations. From capacitance measurements the Fermi energy is determined to EF = (0.4 ± 0.1) eV. The contribution of Friedel oscillations to the capacitance is also discussed. [Russian Text Ignored].
Databáze:	OpenAIRE
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