Popis: |
The performance of a dedicated low energy (5–20 keV) non-mass-analyzed solar cell ion implanter is described. Using a new high throughput system, up to 600 4″ silicon wafers are processed per hour. Design features that yield an implant uniformity of better than 5% are presented. The wafer transport system including microprocessor control, continuous cassette-to-cassette operation, wafer cooling, and dose control are discussed. In addition, performance characteristics of non-mass-analyzed solar cells will be presented. |