Thermo-optical properties of high-refractive-index plasma-deposited hydrogenated amorphous silicon-rich nitride films on glass
| Autor: | Maria Jurzecka-Szymacha, Janusz Jaglarz, S. Kluska, Katarzyna Tkacz-Śmiech |
|---|---|
| Rok vydání: | 2020 |
| Předmět: |
Amorphous silicon
Materials science business.industry High-refractive-index polymer Infrared spectroscopy 02 engineering and technology Chemical vapor deposition Nitride 021001 nanoscience & nanotechnology 01 natural sciences Electronic Optical and Magnetic Materials Amorphous solid 010309 optics chemistry.chemical_compound chemistry 0103 physical sciences Transmittance Optoelectronics 0210 nano-technology business Refractive index |
| Zdroj: | Optical Materials Express. 10:2749 |
| ISSN: | 2159-3930 |
| DOI: | 10.1364/ome.396150 |
| Popis: | Optical and thermo-optical studies of hydrogenated amorphous silicon-rich nitride films were carried out. The films were produced by plasma-assisted chemical vapor deposition on glass. It is shown that the films deposited under appropriately selected processing conditions contain little nitrogen, as confirmed by Fourier-transform infrared spectroscopy therefore they are referred to as silicon-rich nitrides, a-SRN:H. Spectroscopic ellipsometry, reflectance, and transmittance spectroscopy were used to determine the optical indexes of the films and their thicknesses. It results from the ellipsometric measurements performed within a 190-1700nm spectral wavelength range that a-SRN:H films exhibit a high refractive index of about 3.7. It is also shown that post-deposition annealing up to 300°C does not affect the optical parameters of the films. Additionally, they are transparent in the near-infrared region, which makes them a good candidate for applications in various optoelectronic systems. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|