Method for endurance optimization of the HIMOS/sup TM/ flash memory cell

Autor: T. Vermeulen, T. Yao, Dirk Wellekens, A. Lowe, N. Bellafiore, J. Van Houdt
Rok vydání: 2005
Předmět:
Zdroj: 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual..
Popis: A negative oxide charge located at the split-point is the main cause of threshold voltage window closure in source side injection flash EEPROM cells under 10/sup 5/ write/erase cycles. We show a slow trapping rate and a temperature dependence of the detrapping rate below 100/spl deg/C. The detrapping rate is not temperature dependent between 100/spl deg/C and 250/spl deg/C. Finally, the split-point charge formation can be significantly reduced by using of a ramped write pulse.
Databáze: OpenAIRE