ChemInform Abstract: LPCVD of Silicon Nitride from Dichlorosilane and Ammonia by Single Wafer Rapid Thermal Processing

Autor:	Yoshihide Senzaki, Dana Teasdale, Phillip Schubert, Robert Herring, Gary Hoeye, Lawrence Page
Rok vydání:	2010
Předmět:	Ammonia chemistry.chemical_compound chemistry Silicon nitride Rapid thermal processing business.industry Dichlorosilane Optoelectronics Wafer General Medicine Chemical vapor deposition business
Zdroj:	ChemInform. 32
ISSN:	1522-2667 0931-7597
DOI:	10.1002/chin.200130237
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::58d6fdc61661d1fcddc423e086a36b15 https://doi.org/10.1002/chin.200130237 Zobrazit plný text záznamu Plný text