Diffusion barriers between gold and semiconductors

Autor: Ronald S. Nowicki
Rok vydání: 1982
Předmět:
Zdroj: Gold Bulletin. 15:21-24
ISSN: 2190-7579
0017-1557
DOI: 10.1007/bf03216567
Popis: The effectiveness of a number of semiconductor devices depends on the efficiency with which interdiffusion between the semiconductor and metals, which must be applied to it either as contacts or conductive metallizations, can be blocked. Comparisons of the characteristics of the diffusion barriers which can be used between gold and semiconductors — such as those which are made here — therefore have considerable significance.
Databáze: OpenAIRE