Study on organosilicon positive resist. III. Organosilicon positive excimer laser resist (OSPR-2016)
| Autor: | Kazuo Nate, Hisashi Sugiyama, Akiko Mizushima |
|---|---|
| Rok vydání: | 1992 |
| Předmět: |
Materials science
Polymers and Plastics Excimer laser medicine.medical_treatment Bilayer Analytical chemistry Concentration effect General Chemistry Surfaces Coatings and Films law.invention chemistry.chemical_compound Resist chemistry law Polymer chemistry Materials Chemistry medicine Ladder polymer Photolithography Organosilicon |
| Zdroj: | Journal of Applied Polymer Science. 44:1591-1594 |
| ISSN: | 1097-4628 0021-8995 |
| DOI: | 10.1002/app.1992.070440911 |
| Popis: | A new alkali-developable organosilicon positive excimer laser (KrF) resist (OSPR-2016) has been developed for a bilayer resist system. OSPR-2016 is composed of poly (p-hydroxybenzylsilsesquioxane) and methyl cholate-tris (α-diazoacetoacetate). The ratio is 72.5 : 27.5 w/w. A sample of 0.5-μm thick OSPR-2016 resolved 0.35 μm L&S patterns when exposed to a dose of 320 ml/cm 2 from an excimer laser projection printer (NA=0.37) |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Plný text