Properties of Amorphous SiC:O:H Films Prepared by Magnetron Sputtering of Si in CH4 and CO2

Autor:	Isamu Nakaaki, Tomuo Yamaguchi, Hiromu Iwata, Nobuo Saito, Shoji Yoshioka, Sigeaki Nakamura
Rok vydání:	2001
Předmět:	Electrical and Electronic Engineering Condensed Matter Physics Surfaces Coatings and Films
Zdroj:	SHINKU. 44:605-608
ISSN:	1880-9413 0559-8516
DOI:	10.3131/jvsj.44.605
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::585f0204d12da67da1ce2c3578e73ff9 https://doi.org/10.3131/jvsj.44.605 Zobrazit plný text záznamu