Effects of CF3I Plasma for Reducing UV Irradiation Damage in Dielectric Film Etching Processes

Autor:	Seiji Samukawa, Yoshinari Ichihashi, Yasushi Ishikawa, Mitsuru Okigawa, Hideki Mizuhara, Ryu Shimizu
Rok vydání:	2006
Předmět:	Materials science Etching (microfabrication) business.industry Optoelectronics Nanotechnology Plasma Irradiation Dielectric business
Zdroj:	Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials.
DOI:	10.7567/ssdm.2006.p-1-28
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::583d8667459be1478bf27bf8068427f6 https://doi.org/10.7567/ssdm.2006.p-1-28 Zobrazit plný text záznamu