Investigation of an atomic‐layer‐deposited Al 2 O 3 diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform
Autor: | Michael Meischein, David Zanders, Yujiao Li, Alfred Ludwig, Anjana Devi |
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Rok vydání: | 2021 |
Předmět: |
Materials science
Diffusion barrier Silicon business.industry chemistry.chemical_element Surfaces and Interfaces General Chemistry Atom probe Condensed Matter Physics Atomic units Surfaces Coatings and Films law.invention Atomic layer deposition chemistry law Materials Chemistry Optoelectronics Thin film business Platinum Layer (electronics) |
Zdroj: | Surface and Interface Analysis. 53:727-733 |
ISSN: | 1096-9918 0142-2421 |
Databáze: | OpenAIRE |
Externí odkaz: |