Hard mask etch process development for patterning 60nm magnetic tunnel junction
| Autor: | Xiaohui Li, Hailong Liu, Ruiping Zhu, Jipeng Liu, Zhongyi He, Qingjun Zhou |
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| Rok vydání: | 2022 |
| Zdroj: | 2022 China Semiconductor Technology International Conference (CSTIC). |
| Databáze: | OpenAIRE |
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