Finishing of Ge nanomachined surfaces for X-ray crystal optics
Autor: | Peter Siffalovic, Igor Maťko, Jozef Keckes, Zdenko Zápražný, D. Korytár, Eva Majkova, Jakub Hagara, Peter Nádaždy, Yuriy Halahovets, Matej Jergel |
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Rok vydání: | 2018 |
Předmět: |
010302 applied physics
0209 industrial biotechnology Materials science Ion beam business.industry Orders of magnitude (temperature) Mechanical Engineering Polishing 02 engineering and technology Diamond turning 01 natural sciences Industrial and Manufacturing Engineering Computer Science Applications Monocrystalline silicon 020901 industrial engineering & automation Control and Systems Engineering 0103 physical sciences Surface roughness Optoelectronics Crystal optics Irradiation business Software |
Zdroj: | The International Journal of Advanced Manufacturing Technology. 96:3603-3617 |
ISSN: | 1433-3015 0268-3768 |
DOI: | 10.1007/s00170-018-1853-9 |
Popis: | Surface nanomachining based on single-point diamond turning is a viable technology for the preparation of high-quality surfaces. It found its first extensive use in infrared optics, but it is also attractive for X-ray optics. The challenge is that the X-rays used in laboratories have wavelengths 4 orders of magnitude shorter than infrared radiation. Though recent studies have shown promising results, periodic surface ripples as a footprint of the regular cutting tool scanning proved to be an unavoidable feature, producing unwanted effects in reciprocal space. Hence, the presented paper addresses the problem of finishing Ge monocrystalline X-ray surfaces while keeping all benefits of nanomachining. To do so, chemomechanical polishing, Ar+ ion beam bombardment, and UV laser irradiation were tested separately. Chemomechanical polishing proved to be rather time consuming, whereas ion beam bombardment was not sufficient to suppress the ripples even at the highest available energies. In contrast, UV laser irradiation turned out to be a suitable and time-efficient finishing tool to fully suppress the ripples while keeping the local rms surface roughness around 1 nm. |
Databáze: | OpenAIRE |
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