Inverse polarizer on immersion lithography mask
| Autor: | Tsai-Sheng Gau, Chen Minfeng, Shuo-Yen Chou, Chun-Kuang Chen, Ru-Gun Liu |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
Diffraction
Materials science business.industry Image quality 02 engineering and technology Polarizer 021001 nanoscience & nanotechnology 01 natural sciences law.invention 010309 optics Optics law 0103 physical sciences Optoelectronics Photomask 0210 nano-technology business Lithography Diffraction grating Aerial image Immersion lithography |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.2225127 |
| Popis: | The inverse polarizing effect of Sub-Wavelength Metallic Gratings (SWMGs) is employed to improve the lithography performance by controlling the polarization. The SWMGs are intentionally created on the top surface of mask. Its polarization selectivity is deliberately designed according to the bottom mask patterns. A series of simulations and optimizations on SWMG structures were done in order to achieve better image quality. We demonstrate that the contrast of aerial image can be improved by designing the inverse polarizer on mask (iPOM) for some specific layout patterns. We also reveal that the double diffraction inevitably occurring in-between the iPOM and layout pattern may damage the image quality in most situations. This leads to narrow usage of iPOM. An alternative to overcome the double diffraction is proposed by optimizing the refractive index and thickness of layout absorber to make the polarization selection feasible without iPOM. |
| Databáze: | OpenAIRE |
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