CH3OH Concentration and Total Pressure Dependence of Diamond Films Formed from CH3OH-H2 Mixed Gas by Magnet-Active Microwave Plasma Chemical Vapor Deposition

Autor:	Tohru Inoue, Shumpei Yamazaki, Masaya Kadono, Akiharu Miyanaga
Rok vydání:	1993
Předmět:	Hydrogen Chemistry General Engineering Analytical chemistry General Physics and Astronomy chemistry.chemical_element Diamond Chemical vapor deposition engineering.material Carbon film Torr engineering Light emission Thin film Total pressure
Zdroj:	Japanese Journal of Applied Physics. 32:3231
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.32.3231
Popis:	Diamond films were deposited by a magnetic-field-assisted microwave plasma from CH 3 OH-H 2 mixed gas at the pressure range from 0.1 Torr to 0.5 Torr and a CH 3 OH concentration of 17-100%. CH 3 OH concentration and total pressure dependence of the diamond films were examined. We observed that the deposition rate decreased and the quality of diamond films improved as the total pressure and the CH 3 OH concentration increased. Secondary ion mass spectroscopic analysis showed that the diamond films contain hydrogen in a concentration greater than 5×10 19 cm -3
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::572e810d58f36d80dcc4cb3e6beaf6c6 https://doi.org/10.1143/jjap.32.3231 Zobrazit plný text záznamu