Internal Stress and Electrical Resistivity of Evaporated Antimony Films
| Autor: | Noriko Tamura, Hisashi Horikoshi |
|---|---|
| Rok vydání: | 1963 |
| Předmět: |
Materials science
General Engineering General Physics and Astronomy chemistry.chemical_element Substrate (electronics) Evaporation (deposition) law.invention Amorphous solid Stress (mechanics) Antimony chemistry law Electrical resistivity and conductivity Crystallization Composite material Internal stress |
| Zdroj: | Japanese Journal of Applied Physics. 2:328 |
| ISSN: | 1347-4065 0021-4922 |
| DOI: | 10.1143/jjap.2.328 |
| Popis: | Internal stress and electrical resistivity are simultaneously determined for evaporated antimony films during and after evaporation. At first antimony is deposited in the amorphous state. When a critical thickness is reached, the film begins to cristallize giving rise to large intrinsic stress. The dependence of stress upon film thickness, evaporation rate and substrate temperature is experimentally studied. The results can be explained by variation in the effective critical thickness, d e f f , which is defined as the film thickness at which crystallization of the antimony film proceeds most vigorously. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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