Neutron depth profiling at the National Bureau of Standards

Autor:	Robert G. Downing, D.H. Vincent, R.F. Fleming, J.K. Langland
Rok vydání:	1983
Předmět:	Materials science Thin layers Boron concentration Silicon chemistry General Engineering Analytical chemistry chemistry.chemical_element Neutron depth profiling Neutron radiation Boron Borophosphosilicate glass Single crystal sapphire
Zdroj:	Nuclear Instruments and Methods in Physics Research. 218:47-51
ISSN:	0167-5087
DOI:	10.1016/0167-5087(83)90953-5
Popis:	The recently established neutron depth profiling facility at the 10 MW reactor of the National Bureau of Standards in Gaithersburg, MD is described. The facility uses a 9.5 mm diameter neutron beam filtered through 200 mm of single crystal sapphire to give an intensity of 3 × 10 8 n/s, a cadmium ratio for gold of 10 4 and a gamma dose of only 200 mrad/h. Examples of initial work are: range measurements with boron implanted in silicon; observations on near-surface boron in glass; and boron concentration profiles in thin layers of borophosphosilicate glass.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::571e45e394667d14051d11a680877883 https://doi.org/10.1016/0167-5087(83)90953-5 Zobrazit plný text záznamu