Kinetic simulations of plasma dynamics in the EUV sources

Autor:	Kirill V. Lezhnin, Samuel Totorica, Abdullah Hyder, John Sheil, Oscar Versolato, Ahmed Diallo, William Fox
Rok vydání:	2023
Zdroj:	Optical and EUV Nanolithography XXXVI.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::56be97a5bccd25ec6c22c1d64c75fc1a https://doi.org/10.1117/12.2658454 Zobrazit plný text záznamu