Pulsed chemical vapor deposition for crystalline aluminum nitride thin films and buffer layers on silicon and silicon carbide

Autor:	Aaron J. McLeod, Scott T. Ueda, Ping C. Lee, Jeff Spiegelman, Ravindra Kanjolia, Mansour Moinpour, Jacob Woodruff, Andrew C. Kummel
Rok vydání:	2023
Předmět:	Materials Chemistry Metals and Alloys Surfaces and Interfaces Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Thin Solid Films. 768:139717
ISSN:	0040-6090
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::56a17ced7f53fa065f22c2f152df6fe6 https://doi.org/10.1016/j.tsf.2023.139717 Zobrazit plný text záznamu Full Text from ScienceDirect