Negative differential resistance in photoassisted field emission from Si nanowires

Autor:	M. Choueib, A. Derouet, P. Vincent, A. Ayari, S. Perisanu, P. Poncharal, C. S. Cojocaru, R. Martel, S. T. Purcell
Rok vydání:	2022
Předmět:	Process Chemistry and Technology Materials Chemistry Electrical and Electronic Engineering Instrumentation Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Journal of Vacuum Science & Technology B. 40:022802
ISSN:	2166-2754 2166-2746
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5624d1d1fb3c3e4d53396fc623093520 https://doi.org/10.1116/6.0001650 Zobrazit plný text záznamu