| Popis: |
Several charge dissipation materials were evaluated for their ability to improve the overlay accuracy during phase shift mask (PSM) registered writing on a MEBES system. These included an organic conductive polymer and a number of thin inorganic films, which were applied above or below the resist on a coated mask. When used with the resists, all conductive materials evaluated were capable of providing adequate charge dissipation during registered writing. Overlay accuracy of mean + 3 sigma |
