Elementary and Structural Effects on Mechanical Properties of Silicon Incorporated Amorphous Hydrogenous Carbon Films
| Autor: | Takahito Tanibuchi, Yoshitada Isono, Takeshi Tanaka, Nobuyuki Terayama |
|---|---|
| Rok vydání: | 2003 |
| Předmět: |
Materials science
Silicon Hydrogen Mechanical Engineering Analytical chemistry chemistry.chemical_element Chemical vapor deposition Amorphous solid Condensed Matter::Materials Science chemistry.chemical_compound Carbon film chemistry Amorphous carbon Mechanics of Materials Condensed Matter::Superconductivity General Materials Science Physics::Atomic Physics Carbon Tetramethylsilane |
| Zdroj: | TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series A. 69:602-609 |
| ISSN: | 1884-8338 0387-5008 |
| DOI: | 10.1299/kikaia.69.602 |
| Popis: | This paper studies elementary and structural effects on mechanical properties of silicon incorporated amorphous hydrogenous carbon films. Fifteen kinds of the carbon films were prepared by plasma-enhanced chemical vapor deposition method of the penning ionization gauge discharge type using argon, acethylen and tetramethylsilane gases. X-ray photoelectron and Raman spectroscopes performed elementary and microstructural analyses of the carbon films, respectively. Nano-indentation tests were also carried out in order to characterize the reduced elastic modulus and hardness of the carbon films. Intermixture of the tetramethylsilane gas led to a formation of silicon-carbon bonding and an increase of hydrogen atoms in the films. Hydrogen atoms also increased with a reduction of the negative bias voltage at the film substrate. The reduced modulus and hardness of the carbon films ranged from 53 GPa to 163 GPa and from 9 GPa to 29 GPa, respectively. Better mechanical properties resulted from a reduction of tetramethylsilane gases and an increase of the negative bias voltage. The bias voltage especially had a larger influence on the mechanical properties than the gas flow rate. Molecular orbital calculations revealed that the role of a double bond of carbon atoms was likely significant for better mechanical properties of the carbon films. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|